
The advanced material characterization technology utilizes the interaction between electrons, photons, ions, atoms, strong electric fields, thermal energy, etc., and the solid surface to measure the energy spectra, spectra, mass spectra, spatial distributions, or diffraction images of electrons, photons, ions, atoms, and molecules scattered or emitted from the surface, and characterize relevant parameters such as the surface micro-morphology, surface roughness, surface micro-area composition, surface organizational structure, surface phase structure, surface coating structure and composition of materials.
| Project Overview
The advanced material characterization technology utilizes the interaction between electrons, photons, ions, atoms, strong electric fields, thermal energy, etc., and the solid surface to measure the energy spectra, spectra, mass spectra, spatial distributions, or diffraction images of electrons, photons, ions, atoms, and molecules scattered or emitted from the surface, and characterize relevant parameters such as the surface micro-morphology, surface roughness, surface micro-area composition, surface organizational structure, surface phase structure, surface coating structure and composition of materials.
| Commonly Used Detection Technologies
Technologies such as X-ray energy spectrum analysis (EDS), Auger electron spectroscopy (AES), X-ray photoelectron energy spectrum analysis (XPS), dynamic secondary ion mass spectrometry analysis (D-SIMS), time-of-flight secondary ion mass spectrometry analysis (TOF-SIMS), focused ion beam analysis (FIB), and ion grinding and polishing (CP).
· X-ray photoelectron energy spectrum analysis (XPS)
X-ray photoelectron energy spectrum can not only determine the constituent elements on the surface but also provide information on the chemical states of each element. It has high energy resolution and a certain spatial resolution (currently on the micrometer scale). It is used to determine the constituent elements on the surface and provide information on the chemical states of each element.
1. Qualitative and quantitative analysis of elements from Li to U
2. Valence state analysis of elements from Li to U
3. Detection limit: 0.1%
4. UPS function (work function, valence band spectrum)
5. In-depth analysis with a maximum depth of 1 μm
6. The minimum analysis area is 30-400 μm, and the depth is 5-10 nm
Application Cases
Analysis of surface elements and valence states of zirconium alloy tubes after high-temperature friction
· Time-of-flight secondary ion mass spectrometry analysis (TOF-SIMS)
Time-of-flight secondary ion mass spectrometry excites the sample surface with primary ions to eject a tiny number of secondary ions. The mass of the ions is determined based on the different times it takes for the secondary ions to reach the detector due to their different masses. It can provide structural information such as elements and molecules of surfaces, thin films, interfaces, and even three-dimensional samples. Its characteristic is that the secondary ions come from a single atomic or molecular layer on the surface (within 1 nm), carrying only the chemical information of the surface. It features a small analysis area, shallow analysis depth, and non-destructive testing of the sample.
1. Qualitative analysis of all elements and isotopes (including H)
2. Qualitative analysis of organic molecular formulas and functional groups
3. Detection limit: ppm
4. The minimum analysis area is 1 μm, and the depth is 1-10 nm
5. The maximum area scan is 300X300μm
| MTT Advantages
1. Professional Team: A team of highly experienced testing engineers and technical experts.
2. Advanced Equipment: Equipped with internationally leading testing instruments to ensure accuracy and reliability of results.
3. Efficient Service: Rapidly respond to customer needs and provide one-stop, high-efficiency inspection services.
4. Authoritative Certification: The laboratory is certified by ISO/IEC 17025, ensuring that test reports have international credibility.